Electron Microscopy Supplies
Electron Microscopy Sciences Graphene Oxide 2 Layers on Lacey Carbon on 300 Mesh Cu Grid
Graphene oxide on lacey carbon film support on a 300 mesh copper grid.
Type: 2 layers
Electron Microscopy Sciences Graphene on Thermal SiO2 on Ultra-Flat Silicon, 3-5 layers, 1.0-1.7 nm thick, 85.8-90.4% Transparency
CVD graphene on ultra-flat thermal SiO2. The high quality graphene is produced by chemical vapor deposition, a process by which gaseous reactants are deposited onto a substrate. The Ultra-flat Thermal SiO2 Substrate consists of a 200 nm thermally grown SiO2 film on an ultra-flat silicon wafer with a normal thickness of 675 um. The size is 5 mm x 5 mm. Graphene coverage of the TEM grid is better than 75 percent. Available in four thicknesses of CVD graphene, 1, 2, 3-5, and 6-8.
Layers: 3-5 layers
Thickness: 1.0-1.7 nm
Transparency: 85.8-90.4%
Electron Microscopy Sciences AFM Substrate Ultra-Flat Silicon Wafer 6", 150 mm diameter, <100> Orientation
These ultra-flat wafers can be used for substrate studies or as substrate for AFM and SEM samples by cleaving the wafer.
Diameter: 150 mm
Orientation: <100>
Thickness: 675 µm±20 µm
Roughness: Typically 2-3Å
Resistivity: 10-20 Ohm-cm
Electron Microscopy Sciences AFM Substrate Type P Silicon Wafer 1", 25 mm diameter, <100> Orientation
These silicon wafers can be used for substrate studies or as substrate for AFM and SEM samples by cleaving the wafer. The wafers are polished on one side.
Diameter: 25 mm
Orientation: <100>
Thickness: 254-304 µm
Roughness: 2nm
Resistance: 1-30 ohms
Electron Microscopy Sciences mPrep™ X-Pierce hairline cross-cut piercable film
mPrep System Accessory compatible with mPrep/s and mPrep/g.
Electron Microscopy Sciences PolarStat™ Polarstat Embedding Medium 4 OZ
An aqueous-based frozen section embedding medium designed to support tissue blocks in cryostat sectioning. Formulated to promote rapid freezing, enhanced sectioning and consistent results at a working temperature of -20 degree C.
Electron Microscopy Sciences Graphene Oxide Support film on Quantifoil R1.2/1.3, Cu 400 mesh
Graphene Oxide (GO) support film is a super thin (<1nm), naturally hydrophilic layer placed over the support film on grids. Pre-treatment of GO Support Films is unnecessary - by default, the hydrophilic surface spreads particles evenly across the grid. A hydrophobic surface can be achieved by heating in the air.
It works well with holey carbon, lacey carbon, and Quantifoil grid types, effectively spanning the gaps. It is less expensive than graphene to produce due to complexity of graphene manufacturing and has a better background contrast than graphene resulting in higher resolution. Nearly transparent in electron beam and barely visible under optical microscopes. Regular batch checking ensures correct coverage of monomers.
Note: plasma cleaning or glow discharge will damage the support film.
Material: Copper
Mesh: 400
Electron Microscopy Sciences Graphene Oxide Support film on Quantifoil R2/4, Cu 200 mesh
Graphene Oxide (GO) support film is a super thin (<1nm), naturally hydrophilic layer placed over the support film on grids. Pre-treatment of GO Support Films is unnecessary - by default, the hydrophilic surface spreads particles evenly across the grid. A hydrophobic surface can be achieved by heating in the air.
It works well with holey carbon, lacey carbon, and Quantifoil grid types, effectively spanning the gaps. It is less expensive than graphene to produce due to complexity of graphene manufacturing and has a better background contrast than graphene resulting in higher resolution. Nearly transparent in electron beam and barely visible under optical microscopes. Regular batch checking ensures correct coverage of monomers.
Note: plasma cleaning or glow discharge will damage the support film.
Material: Copper
Mesh: 200
Electron Microscopy Sciences Graphene Oxide Support film on Quantifoil R2/2, Cu 300 mesh
Graphene Oxide (GO) support film is a super thin (<1nm), naturally hydrophilic layer placed over the support film on grids. Pre-treatment of GO Support Films is unnecessary - by default, the hydrophilic surface spreads particles evenly across the grid. A hydrophobic surface can be achieved by heating in the air.
It works well with holey carbon, lacey carbon, and Quantifoil grid types, effectively spanning the gaps. It is less expensive than graphene to produce due to complexity of graphene manufacturing and has a better background contrast than graphene resulting in higher resolution. Nearly transparent in electron beam and barely visible under optical microscopes. Regular batch checking ensures correct coverage of monomers.
Note: plasma cleaning or glow discharge will damage the support film.
Material: Copper
Mesh: 300
Electron Microscopy Sciences TEM Window Grid Silicon Nitride Film, (8) 100 µm, (1) 100x350 µm, 20 nm
Silicon Nitride TEM Window Grids perform well under harsh conditions. They tolerate temperatures above 1000 deg C and support use in environmental TEMs where dynamic processes are observed at high temperatures. They provide an ideal balance of imaging resolution, chemical stability and mechanical strength. They can be vigorously plasma cleaned to remove organic contamination. The incorporate LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces.
Silicon frames are 100um thick. There is less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid. Grids fit standard 3mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation.
Dimensions: (8) 100 µm, (1) 100x350 µm
Thickness: 20 nm
Electron Microscopy Sciences Graphene Oxide Support film on Quantifoil R1.2/1.3, Cu 400 mesh
Graphene Oxide (GO) support film is a super thin (<1nm), naturally hydrophilic layer placed over the support film on grids. Pre-treatment of GO Support Films is unnecessary - by default, the hydrophilic surface spreads particles evenly across the grid. A hydrophobic surface can be achieved by heating in the air.
It works well with holey carbon, lacey carbon, and Quantifoil grid types, effectively spanning the gaps. It is less expensive than graphene to produce due to complexity of graphene manufacturing and has a better background contrast than graphene resulting in higher resolution. Nearly transparent in electron beam and barely visible under optical microscopes. Regular batch checking ensures correct coverage of monomers.
Note: plasma cleaning or glow discharge will damage the support film.
Material: Copper
Mesh: 400
Electron Microscopy Sciences TEM Window Grid Silicon Nitride Film, 500 µm, 50 nm
Silicon Nitride TEM Window Grids perform well under harsh conditions. They tolerate temperatures above 1000 deg C and support use in environmental TEMs where dynamic processes are observed at high temperatures. They provide an ideal balance of imaging resolution, chemical stability and mechanical strength. They can be vigorously plasma cleaned to remove organic contamination. The incorporate LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces.
Silicon frames are 100um thick. There is less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid. Grids fit standard 3mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation. Recommended use: demanding conditions.
Dimensions: 500 µm
Thickness: 50 nm
Electron Microscopy Sciences Graphene Oxide Support film on Quantifoil R2/4, Cu 200 mesh
Graphene Oxide (GO) support film is a super thin (<1nm), naturally hydrophilic layer placed over the support film on grids. Pre-treatment of GO Support Films is unnecessary - by default, the hydrophilic surface spreads particles evenly across the grid. A hydrophobic surface can be achieved by heating in the air.
It works well with holey carbon, lacey carbon, and Quantifoil grid types, effectively spanning the gaps. It is less expensive than graphene to produce due to complexity of graphene manufacturing and has a better background contrast than graphene resulting in higher resolution. Nearly transparent in electron beam and barely visible under optical microscopes. Regular batch checking ensures correct coverage of monomers.
Note: plasma cleaning or glow discharge will damage the support film.
Material: Copper
Mesh: 200
Electron Microscopy Sciences EDX-XEDS Calibration TEM Window Grid
Germanium is an ideal calibration standard for x-ray energy dispersive spectroscopy in electron microscopes since it is not typically found in TEM columns it cannot be mistaken for instrument components and their signal peaks. For TEM the Ge is suspended across two micron pores that are patterned on a grid of 20 nm thick silicon nitride. The single 500 x 500 micron window is compatible with high tilt angle tomography, since at 70 degrees of tilt, the thin and beveled 100 micron silicon frame allows you to use a ~50x50 micron region within the center of the window from any rotational orientation.
The specimen can be used for detector energy axis and energy resolution calibration, detector window transmission evaluation, detector solid angle measurements, electron optical instrument system peak measurements, and specimen holder penumbra measurements.
Electron Microscopy Sciences TEM Window Grid Silicon Nitride Film, 500 µm, 20 nm
Silicon Nitride TEM Window Grids perform well under harsh conditions. They tolerate temperatures above 1000 deg C and support use in environmental TEMs where dynamic processes are observed at high temperatures. They provide an ideal balance of imaging resolution, chemical stability and mechanical strength. They can be vigorously plasma cleaned to remove organic contamination. The incorporate LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces.
Silicon frames are 100um thick. There is less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid. Grids fit standard 3mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation. Use: everyday imaging.
Dimensions: 500 µm
Thickness: 20 nm